Design by grower for grower
Challenges in diamond growth
- Maintaining stable microwave plasma is difficult
- Gas ratio (CH₄/H₂) must be tightly balanced
- Plasma can arc or touch chamber walls, causing damage
- Nucleation is hard on non-diamond substrates
- Seed crystal orientation affects single-crystal growth
- Trace impurities (O, N, Si) lead to defects
- Risk of forming graphite or amorphous carbon
- High microwave power requires robust reactor design
- Reactor geometry strongly affects plasma shape and uniformity
- Scaling up growth increases uniformity and thermal challenges
- Substrate heating and cooling must be finely tuned
Features
- The clamshell-style design ensures effective resonance while allowing easy access for operation and maintenance
- Aerospace-grade aluminum alloy chamber can survive even without chill water
- All gas connections utilize Ultra-High Purity (UHP) grade components to ensure contamination-free operation
- The annular quartz window is isolated from direct plasma exposure, thereby preventing any risk of silicon contamination
- The operating pressure can be raised to as high as 300 torr* to enable the formation of high-density, multimode plasma
- High-precision mass flow controllers (MFC) are used to accurately regulate doping concentrations
- Intuitive LabVIEW user interface on Windows, featuring enhanced cloud connectivity
- Four symmetrical CF35 viewports on the sides, and four CF16 plus one CF35 viewport on the top, allow attachment of various characterization instruments
- Experienced PhD teams with fast response capabilities deliver critical intangible value to drive success
- A robust safety interlock mechanism prevents unsafe operation and protects both users and equipment
*: Other operation conditions also apply to achieve high-pressure operation.
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